a.abdelrahman

Ahmed Abd EL-Rahman

Professor - Plasma Physics

Faculty of science

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Academic Qualificatin

B. Sc. in physics (Very good, 81.6%) May 1996,  South Valley University, Egypt

M. Sc. in Plasma Applications (January, 2001), South Valley University, Egypt

Ph.D. in Plasma Applications (February, 2005), South Valley University, Egypt through a DAAD scholarship, TU-Dresden and Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, Germany..

Assistant Professor (2010), Faculty of Science, Sohag University, Egypt

Full Professor (November 2015), Physics Department, Faculty of Science, Sohag University, Egypt 

Employment Record

December, 1997-January, 2001: Full time Demonstrator: Department of Physics, Faculty of Science, South Valley University, Sohag, Egypt.

March, 2001- February 2005: Full time Assistant lecturer Physics Department, Faculty of Science, South Valley University, Sohag, Egypt.

March, 2005-October 2010, Full time lecturer Physics Department, Faculty of Science, Sohag University, Sohag, Egypt.

November, 2010 – October 2015, Full time Assistant Professor, Physics Department, Faculty of Science, Sohag University, Sohag, Egypt.

November, 2015 – until present, Full time Professor, Physics Department, Faculty of Science, Sohag University, Sohag, Egypt.

Since January 2016, working as academic consaltant at KAU, SA

 

 Editorial Board of the Scientific Research Journals

  Engineering Research Express -IOP


2020-07-25 11:29:18 | Keywords
Enhancement of Adhesion Force and Surface Conductivity of Graphene Oxide Films Using Different Solvents
In this work, the nanotechnology procedure was utilized to improve both the adhesion force and surface properties of graphene oxide (GO) films. GO has been obtained in a powder form by oxidation purified graphite using the modified Hummer's technique. Different films of GO nanoparticles (NPs) were deposited using several types of solvents distilled water, acetone, ethanol, dimethyl formamide (DMF) or ... Read more

2020-07-25 11:25:28 | Keywords Ti-Al-N film,
Physical, electrochemical, and biocompatibility characteristics of Ti-Al-N thin film synthesized by DC pulsed magnetron sputtering
Owing to the desired mechanical and biomedical characteristics of TiN-based coatings and the encourage features of pulsed magnetron sputtering, the current study was conducted to deposit Ti-Al-N thin film on AISI 316 using DC pulsed magnetron sputtering. All processing parameters were constant excluding the pulsed magnetron power which was varied from 100 to 175 W. The effect of processing power ... Read more

2020-07-25 11:21:33 | Keywords SnO2−xNx nanowires Vapor trans,
Properties of SnO2 and SnO2−xNx grown on the boat walls using vapor transport method
The aim of the study was to examine the properties of SnO2 and SnO2−_x_N_x_ nanowires (NWs) grown on the walls of the boat of the vapor transport system. Nanowires of SnO2 and SnO2−_x_N_x_ were synthesized using Ar plus O2 and N2 plus O2 gas mixtures, respectively. The obtained chemical compositions were SnO2 and SnO1.71N0.18. In both cases, tetragonal single-phase SnO2 ... Read more

2020-07-25 11:15:05 | Keywords Titanium oxynitridesdc sputter,
Preparation and characterization of nanostructured titanium oxynitride films for the application in self-cleaning and photoelectrochemical water splitting
Titanium oxynitride (TiOxNy) films capped with 10 nm titanium oxide (TiO2) layer were prepared using reactive direct current magnetron sputtering from pure Ti target. Part of the samples was annealed. Energy dispersive analysis of X-ray revealed that all the samples contain nitrogen and the incorporation of nitrogen into the oxynitrides is not linear. Phase investigation by X-ray diffraction showed structural ... Read more

2020-07-25 11:10:48 | Keywords 2020,
Effect of N-2/TMS Gas Ratio on Mechanical and Erosion Performances of Ti-Si-CN Nanocomposite Coatings
To optimize the tribo-mechanical performance of thick Ti-Si-CN nanocomposite coatings for a wide range of harsh industrial applications, reactive gases of nitrogen and trimethylsilane were employed with specific flow rates of PEMS process. Plasma-enhanced magnetron sputtering (PEMS) was employed for depositing thick Ti-Si-C-N nanocomposite (22-27 µm) on Ti-6Al-4V substrates at relatively high deposition rate up to 4.5 µm/h. Controlling the ... Read more