Effect of DC-pulsed magnetron sputtering power on structural, tribological and biocompatibility of Ti–Zr–N thin film
The Dc. pulsed magnetron sputtering was employed to deposit Ti-Zr-N thin film on AISI 316 substrates. All the plasma parameters were kept to be constant except the plasma-processing power which was varied from 125 W to 250 W. The structure, tribological, electrochemical and biocompatibility properties of Ti-Zr-N films have been investigated. X-ray patterns confirmed the formation of solid solution phase ... Read more