The purpose ot this article was to survey the microstrcture and various properties (mechanical, optical and electrical) of titanium dioxide TiO2 thin coated deposited on glass substrate by pulsed magnetron sputtering (PMS) method. The coatings were deposited by aputtering pure Ti target at amexture 90% Ar and 10% O2 at a constant total working gas pressure of 5*10-3 mbar. The applied power with a frequency of 120 kHz was varied from 100w to 225w for operation time of 25 min. The structural and various properties of TiO2 thin coating with the different applied powers have been investigated. XRD specture show formation of TiO2 rutile as a result of plasma oxygen. The optical band gap of the TiO2 increased up to 4.02 ev as the power increases up to 200w. The obtained date show an increase of TiO2 transmittance as the plasma applied power increases.