Zirconium oxynitride films were deposited onto glass and Si (1 0 0) substrates at room temperature by pulsed reactive dc magnetron sputtering of a metallic Zr target in an Ar/O2/N2 atmosphere. The structural, compositional and optical properties of the deposited films were found to depend on the ratio of nitrogen partial pressure to the total reactive gas partial pressure. Morphology ...
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