To optimize the tribo-mechanical performance of thick Ti-Si-CN nanocomposite coatings for a wide range of harsh industrial applications, reactive gases of nitrogen and trimethylsilane were employed with specific flow rates of PEMS process. Plasma-enhanced magnetron sputtering (PEMS) was employed for depositing thick Ti-Si-C-N nanocomposite (22-27 µm) on Ti-6Al-4V substrates at relatively high deposition rate up to 4.5 µm/h. Controlling the ... Read more

Titanium oxynitride (TiOxNy) films capped with 10 nm titanium oxide (TiO2) layer were prepared using reactive direct current magnetron sputtering from pure Ti target. Part of the samples was annealed. Energy dispersive analysis of X-ray revealed that all the samples contain nitrogen and the incorporation of nitrogen into the oxynitrides is not linear. Phase investigation by X-ray diffraction showed structural ... Read more

The aim of the study was to examine the properties of SnO2 and SnO2−_x_N_x_ nanowires (NWs) grown on the walls of the boat of the vapor transport system. Nanowires of SnO2 and SnO2−_x_N_x_ were synthesized using Ar plus O2 and N2 plus O2 gas mixtures, respectively. The obtained chemical compositions were SnO2 and SnO1.71N0.18. In both cases, tetragonal single-phase SnO2 ... Read more

Owing to the desired mechanical and biomedical characteristics of TiN-based coatings and the encourage features of pulsed magnetron sputtering, the current study was conducted to deposit Ti-Al-N thin film on AISI 316 using DC pulsed magnetron sputtering. All processing parameters were constant excluding the pulsed magnetron power which was varied from 100 to 175 W. The effect of processing power ... Read more

In this work, the nanotechnology procedure was utilized to improve both the adhesion force and surface properties of graphene oxide (GO) films. GO has been obtained in a powder form by oxidation purified graphite using the modified Hummer's technique. Different films of GO nanoparticles (NPs) were deposited using several types of solvents distilled water, acetone, ethanol, dimethyl formamide (DMF) or ... Read more

The DC-pulsed magnetron sputtering was employed to deposit Ti–Zr–N thin film on AISI 316 substrates. All the plasma parameters were kept to be constant except the plasma-processing power which was varied from 125 to 250 W. The structure, tribological, electrochemical and biocompatibility properties of Ti–Zr–N films have been investigated. X-ray patterns confirmed the formation of solid solution phase of Ti–Zr–N ... Read more

Metal plasma immersion ion implantation and deposition (MPIIID) is employed to produce TiAlN hard coatings on Ti substrate. To improve the load-bearing capacity of Ti substrate, nitrogen PIII is used to prepare a bearing TiN layer on Ti-base substrate. The MPIIID process is performed using Ti50:Al50 target for different nitrogen/argon gas fractions. The effect of N2/Ar gas ratio on the ... Read more

Titanium nitrides have good tribo-mechanical and biomedical properties. They are employed to harden and protect cutting and sliding surfaces for industrial purpose and as a non-toxic outer-surface for bio-medical applications. In this study, pure titanium was nitrided using RF plasma technique. The microstructural, mechanical, tribological, electrochemical and biomedical properties of nitrided titanium were investigated. The X-ray diffraction demonstrates the formation ... Read more

In the present study, Ti–Al–V–N coatings were synthesized onto Ti–6Al–4V substrates by plasma enhanced magnetron sputtering (PEMS) of two commercial sputter targets of Ti–6Al–4V in an Ar/N2 gas mixture. After that, the as-synthesized coatings were annealed in air atmosphere at temperature ranging from 500 °C to 900 °C. The as-synthesized and annealed coatings were characterized by X-ray diffraction, Vickers microhardness ... Read more

This study is one part of a series of efforts to optimize the microstructure and tribological properties of the Ti–Si–C–N coatings for a wide range of industrial applications. In this study, Ti–6Al–4V samples were coated with thick Ti–Si–C–N coatings (25–35 μm) using a plasma enhanced magnetron sputtering (PEMS) process, in which Ti was sputtered from two magnetrons at fixed power ... Read more