The Dc. pulsed magnetron sputtering was employed to deposit Ti-Zr-N thin film on AISI 316 substrates. All the plasma parameters were kept to be constant except the plasma-processing power which was varied from 125 W to 250 W. The structure, tribological, electrochemical and biocompatibility properties of Ti-Zr-N films have been investigated. X-ray patterns confirmed the formation of solid solution phase ...
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