Optical Properties of Nanocrystalline/Amorphous TiO2 Thin Film Deposited by rf Plasma Magnetron Sputtering
This work is a part of serious experimental efforts established on constructing multilayers based on TiO2 for industrial use in optical devices. Recognizing the structure and optical features of TiO2 single layer is very significant in designing optical devices and in constructing multilayers based on TiO2 layer for probable industrial requests. In this regard, rf plasma magnetron sputtering was employed ... Read more